JPH0262650U - - Google Patents
Info
- Publication number
- JPH0262650U JPH0262650U JP14312988U JP14312988U JPH0262650U JP H0262650 U JPH0262650 U JP H0262650U JP 14312988 U JP14312988 U JP 14312988U JP 14312988 U JP14312988 U JP 14312988U JP H0262650 U JPH0262650 U JP H0262650U
- Authority
- JP
- Japan
- Prior art keywords
- ion source
- mesh
- source chamber
- microwave
- waveguide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004020 conductor Substances 0.000 claims description 8
- 239000003989 dielectric material Substances 0.000 claims description 2
- 238000001816 cooling Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
Landscapes
- Electron Sources, Ion Sources (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14312988U JPH0262650U (en]) | 1988-10-31 | 1988-10-31 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14312988U JPH0262650U (en]) | 1988-10-31 | 1988-10-31 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0262650U true JPH0262650U (en]) | 1990-05-10 |
Family
ID=31409675
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14312988U Pending JPH0262650U (en]) | 1988-10-31 | 1988-10-31 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0262650U (en]) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5458427B1 (ja) * | 2013-05-27 | 2014-04-02 | 株式会社アドテック プラズマ テクノロジー | マイクロ波プラズマ発生装置の空洞共振器 |
-
1988
- 1988-10-31 JP JP14312988U patent/JPH0262650U/ja active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5458427B1 (ja) * | 2013-05-27 | 2014-04-02 | 株式会社アドテック プラズマ テクノロジー | マイクロ波プラズマ発生装置の空洞共振器 |
WO2014192062A1 (ja) * | 2013-05-27 | 2014-12-04 | 株式会社アドテック プラズマ テクノロジー | マイクロ波プラズマ発生装置の空洞共振器 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4713585A (en) | Ion source | |
US6812647B2 (en) | Plasma generator useful for ion beam generation | |
JP2959508B2 (ja) | プラズマ発生装置 | |
US4609808A (en) | Plasma generator | |
WO2001078469A3 (en) | Z-pinch plasma x-ray source using surface discharge preionization | |
JP2003515433A (ja) | ハイブリッドプラズマ処理装置 | |
CA1248643A (en) | Process and apparatus for igniting an ultra-high frequency ion source | |
KR930011765B1 (ko) | 마이크로파플라즈마 발생장치 | |
JPH0262650U (en]) | ||
JPS63119198A (ja) | プラズマ発生装置 | |
JPS6293834A (ja) | イオン源 | |
JPS63171954U (en]) | ||
JPH0284249U (en]) | ||
JP2727747B2 (ja) | マイクロ波プラズマ発生装置 | |
JPH01183036A (ja) | マイクロ波イオン源 | |
JPH06139978A (ja) | パルス駆動型の電子サイクロトロン共振イオン源 | |
JP2697413B2 (ja) | 高周波イオン源 | |
JPH0650109B2 (ja) | Rf型イオン源 | |
JPH0262649U (en]) | ||
Papenbreer et al. | Pulsed operation of a MPDR‐type ECR‐plasma source for high‐power applications | |
JPH0544136B2 (en]) | ||
JPH01141759U (en]) | ||
JPH02253543A (ja) | プラズマ源 | |
JP2581053B2 (ja) | マイクロ波イオン源 | |
JPH02115244U (en]) |